Dry etching technique.

Dry etching and sputtering.

Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and the surface to be etched. Also, the momentum transfer of an incoming ion can cause direct removal of the material to be etched, which is undesir...

Wet and Dry Etching Theory

Dry Etching Based Silicon Micromachining

The aim of this work is to demonstrate the “dry” etching based micro-fabrication technologies in the manufacturing of Single Crystal Silicon (SCS) for Micro-Electro/(Optical)-Mechanical-Systems (ME(O)MS). The ME(O)MS technology is very fast growing industry branch based often on the same silicon technology as integrated circuits. The process of plasma-dry etching is quite simple straightforward...

Perfectly notched long-period fiber grating filter based on ICP dry etching technique.

This study presents a new process using inductively a coupled plasma dry etching method to manufacture a long-period fiber grating filter with exact period, vertical sidewalls, and smooth etched surfaces, and the filter is thus named a perfectly notched long-period fiber grating (NLPFG). This process can dramatically reduce production time, and thereby provide higher volume production. The fabr...

Silicon Sacrificial Layer Dry Etching (SSLDE) for free-standing

A novel Silicon Sacrificial Layer Dry Etching (SSLDE) technique using sputtered amorphous or LPCVD polycrystalline silicon as sacrificial layers and a dry fluorine-based (SF6) plasma chemistry as releasing process is reported with a detailed experimental study of the release etching step. The process is capable of various applications in surface micromachining process, and can be applied in fab...